SUSS MicroTec Labspin

Resist Spin Coater

Unavailable until 26 Oct, 12:30 Bay 05 Translational Research Hub

Internal name

SuSS Labspin

Process types

Resist Coat and Develop

Description

Compact manual spin coater and developer from SUSS MicroTec (LabSpin series) for laboratory and R&D photolithography. Handles round substrates up to 150mm and forms resist layers from below 1um to several hundred um, applied by syringe or optional automatic dispense, and also supports puddle developing, edge-bead removal and edge coating.