ECM Technologies JIPELEC JetFirst300

Rapid Thermal Annealer
Unavailable until 26 Oct, 12:30 Bay 13A Translational Research Hub
Internal name
RTA2
Process types
Thermal Processing
Description
Annealing of metal-semiconductor contacts over 300mm with a controlled N2 or O2 atmosphere. Thermocouple or pyrometer temperature control upto 1200 °C.
RTA2 image