Oxford Instruments RIE 80

Plasma Etcher
N/3.07 Translational Research Hub
Internal name
RIE2
Equipment managers
Elizabeth Beaumont
Stuart Thomas
Process types
Plasma Etch and Deposition
Description
The Oxford Instruments RIE 80 is a reactive ion etch system which offers versatile etch for dielectrics from small pieces to 150mm wafers. Fluorinated gases are used for etching.