Equipment Information

• Internal Name: MLA150

Description

The MLA150 is a maskless optical lithography tool that uses a 2-dimensional Spatial Light Modulator to project patterns directly onto resist coated wafers. The system features automated front- and backside alignment procedures and a high speed i-line exposure module. Typical write times: 4" wafers <15 minutes, 6" <30 minutes, 8" <60 minutes, with structures down to 1µm.