SUSS MicroTec MJB4 Manual Mask Aligner

Manual contact mask aligner for photolithography on small substrates and pieces, from 5 x 5mm up to 100mm diameter. Supports soft, hard and vacuum contact plus proximity (gap) exposure, resolving features below 0.5um. Optional infrared alignment allows backside registration through IR-transparent substrates such as GaAs, InP and silicon.