Home
Work with us
Capabilities
Standard Processes
Equipment
Customer Information Form
Projects
Case Studies
News & Events
About Us
People
History of the ICS
Account
Login
Register
Equipment
SUSS MicroTec MA08 Gen4 Mask Aligner
SUSS MicroTec MA08 Gen4 Mask Aligner
Mask Aligner
Bay 04
Translational Research Hub
Internal name
MA08
Equipment managers
Tyrone Jones
Michael Lewis
Process types
Optical Lithography
Description
Semi-automated mask and bond aligner with diffraction-reducing optics. UV-LED array: 365nm (i-line), 405nm (h-line), 436nm (g-line) Mask sizes: 100mm, 150mm, 200mm Wafer sizes: 100mm, 150mm, 200mm Top-side, bottom-side and infrared alignment. DirectAlign® allows for 0.5µm alignment (0.25µm with COGNEX® pattern recognition) Proximity lithography and soft/hard/vacuum contact exposure Resolution down to sub-micron scale Wedge error correction with micrometric precision
QR code
QR code
Scans to
https://ics-cardiff.co.uk/equipment/ma08/