Unavailable until 26 Oct, 12:30
Bay 05 Translational Research Hub
Internal name
HP8
Process types
Resist Coat and Develop
Description
SUSS MicroTec HP8 programmable hotplate for photoresist soft-bake, post-exposure bake and hard-bake, part of the SUSS resist-processing line. Processes substrates up to 200mm (or 6 inch square) at temperatures up to 250C with high uniformity and repeatable ramps, with programmable multi-step recipes and optional nitrogen purge.