Raith eLine

The Raith eLine is a combined electron-beam lithography (EBL) and scanning electron microscopy (SEM) system for direct-write nanofabrication and imaging. It uses a thermal field-emission source and a laser-interferometer stage to pattern features down to sub-10nm linewidths, with automated stitching and overlay. Samples from small pieces up to 5 inch wafers are handled via a load-locked stage.