Unavailable until 26 Oct, 12:30
Shared ×2 Bay 05 Translational Research Hub
Internal name
Developer Wet Bench
Process types
Resist Coat and DevelopWet Processing
Description
A Felcon manual wet-processing bench dedicated to photoresist development. Provides controlled dispense of aqueous developer and DI-water rinse, with fume extraction and laminar-flow filtration for consistent, contamination-free develop steps.