Beneq TFS200 Plasma ALD System

Atomic Layer Deposition

Bay 12B Translational Research Hub

Internal name

ALD1

Equipment managers

Rini Lahiri

Saleem Shabbir

Process types

Physical Vapour Deposition

Description

Please enquire about deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.